Electron Microscopy > Focused Ion Beam Microscopes (FIB) Products & Reviews

FIB-SEM optimised for large-volume 3D examinations

JBX-A9 Electron Beam Lithography System

FIB-SEM for the semiconductor sector with 200mm wafer coverage

FIB-SEM for the highest demands on TEM samples

The Hitachi NB5000 FIB-SEM integrates a superior 40kV Ga ion FIB column with an ultra-high-resolution Schottky FE-SEM. Like all our products, all components have been designed with consideration of the total system performance. This results in exceptional stability, milling performance and resolution, allowing e.g. automated mill-and-monitor operations for 3D reconstructions with slicing steps down to 5nm. NB5000 incorporate…

Direct Write E-beam Lithography System

E-Beam Mask/Reticle Writer

This system delivers unmatched capabilities for extreme large-volume 3D analysis, Ga-free sample preparation, and precise micromachining. Featuring an innovative, fully integrated femtosecond laser, it offers the fastest material removal rate with the highest cut face quality.