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Insulator Deposition Induced by Gas Field Ion Source (GFIS) Column: Ultrahigh Resistivity and High Resolution with ZEISS ORION NanoFab

2 Jan 2015

Gallium focused ion beams and electron beams have been used for editing and repairing prototype integrated circuits in the semiconductor industry. With the introduction of gas-assisted FIB deposition and etching, more complex modifications can be made. This white paper demonstrates how the ORION NanoFab provides an attractive approach for fabricating state of the art nanoscale structures with high purity.

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Light MicroscopyLight microscopes or optical microscopes are used to visualize microscale objects under magnification, including cells, clinical specimens and materials. Lab equipment for light microscopy includes confocal microscopes, fluorescence microscopes, zoom and stereo microscopes. Microscope slides and imaging reagents are available for visualizing samples, as well as various microscope stages and incubators for large or temperature-sensitive samples. Find the best light microscopes in our peer-reviewed product directory: compare products, check customer reviews and receive pricing direct from manufacturers.Atomic Force Microscopy / Scanning Tunneling MicroscopyAtomic force microscopes (AFM) and scanning tunneling microscopes (STM) are high-resolution forms of scanning probe microscope (SPM) used to generate topological information of a sample down to the atomic scale. Instruments can generate an image of the surface topology, manipulate objects and reveal information on localized properties such as Young’s modulus, conductivity, and magnetism. High-quality STM and AFM probes optimized for your application are available, as well as other SPM-based instruments such as scanning ion conductance microscopes (SICM) & near-field scanning optical microscopes (NSOM). Find the best AFM and STM equipment in our peer-reviewed product directory: compare products, check customer reviews and receive pricing direct from manufacturers.Nanofabrication
Insulator Deposition Induced by Gas Field Ion Source (GFIS) Column: Ultrahigh Resistivity and High Resolution with ZEISS ORION NanoFab