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Helium and Neon Ion Beam Lithography with ORION NanoFab
16 May 2017This application note describes the use of the ZEISS ORION NanoFab for direct write lithography in resists for creating high feature density structures with critical dimensions below ten nanometers. This is applicable in nanotechnology research, template fabrication, and device prototyping.
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Non-Destructive TechniquesNon-destructive techniques (NDT) describes a variety of analytical techniques used to evaluate the properties of a material. Common methods include ultrasonic, magnetic-particle, liquid penetrant, radiographic, remote visual inspection (RVI), and eddy-current testing. NDT is regularly used in forensic engineering, civil engineering, mechanical engineering, electrical engineering, systems engineering, aeronautical engineering, and medicine.Surface Area TestingPhysisorption studies fundamental parameters essential for the characterization of materials such as the specific surface area and pore size distribution. Properties such as porosity, strength, hardness, permeability, separation selectivity, corrosion, and thermal stress resistance can all be directly correlated to the porous structure of a material.NanotechnologyNanotechnology, or nanotech, is an engineering technique using molecular scale functional systems. Applications of nanotechnology include medicine and medical devices, electronics, air and water purification, food science and energy production.NanolithographyHelium