FEI Opens a New Dimension in Photolithography Process Control

11 Mar 2015

Fundamental limitations in performance of low-voltage scanning electron microscope (SEM) exist, notably resolution at low beam voltages. To overcome this limitation, the Verios Extreme High Resolution (XHR) SEM was developed to reveal fine surface detail with sub-nanometer resolution at very low beam voltages. The Verios XHR SEM is ideally suited to help characterize electron beam sensitive photoresist.

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Electron MicroscopyElectron microscopes (EM) are used to create high-resolution images of samples at the nanoscale by means of an accelerated beam of electrons as a source of illumination. Types of electron microscope include scanning electron microscopes (SEM), transmission electron microscopes (TEM), scanning transmission electron microscopes (STEM) and cryo-electron microscopes. Focused ion beam (FIB) microscopes are useful for modifying or milling a sample surface with nanometer precision, as well as imaging. Find the best electron microscopes in our peer-reviewed product directory: compare products, check customer reviews and receive pricing direct from manufacturers.SEMScanning Electron Microscopy (SEM) is a technique that uses a focused electron beam to scan a sample and create high-resolution images. It is widely used in materials science, nanotechnology, and biological research. Explore SEM systems in our peer-reviewed product directory; compare products, check reviews, and get pricing directly from manufacturers.
FEI Opens a New Dimension in Photolithography Process Control