ResourceSpectroscopy
Determination of Impurities in Semiconductor-Grade Nitric Acid with the NexION 300S ICP-MS
28 Nov 2012Semiconductor devices are currently being designed with smaller line widths and are more susceptible to low-level impurities. Nitric acid is widely used as a mixture with hydrofluoric acid to alter between diffusion-limited or rate-limited etching in the semiconductor industry. In this application note the NexION 300 ICP-MS is shown to be robust and suitable for the routine quantification of ultratrace impurities at the ng/L level in nitric acid. By means of computer-controlled switching between Standard mode and Reaction mode in the Universal Cell, interference-free analysis using hot plasma conditions for all analytes is possible during a single sample run.
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Mass SpectrometryMass spectrometry (MS) is a powerful analytical technique used to identify and quantify molecules based on the mass-to-charge ratio of gas-phase ions. It provides detailed information about the structure, composition, and properties of compounds and is widely used across fields such as environmental monitoring, materials science, drug discovery and development, food and beverage testing, and wider chemical research. Key MS techniques include tandem mass spectrometry (MS/MS), liquid chromatography–mass spectrometry (LS-MS) and inductively coupled plasma (ICP-MS). Choosing from these wide range of techniques and technologies can be a daunting task, so keep up to date with scientific applications, performance expectations, and customer reviews here all in one place. Visit our product directory to receive quotes direct from the manufacturer.
SemiconductorsNitrate