XEI Scientific Reports on the Patent Awarded for their New Method for Producing Oxygen Radicals for use in the Decontamination of High Vacuum Systems

XEI Scientific has announce that the company has been granted a new US patent (#US8507879B2) which describes a new oxidative cleaning method and system for electron microscopes and other high vacuum instrumentation using UV excitation in an oxygen radical source.

The new method and apparatus comprises a vacuum ultraviolet light source housed in an irradiation chamber where it photo dissociates oxygen to be used downstream to clean the chamber or samples in the absence of the UV light. XEI founder and patent holder, Ronald Vane, says this new patent is a result of XEI's on-going research into finding improved cleaning methods for electron microscopes and other high vacuum instruments. This patent research provides an optional path that supplements our work to improve XEI's Evactron® RF plasma cleaning systems.

XEI has sold more than 1800 Evactron systems worldwide solving contamination problems in many different environments using instrumentation such as electron microscopes, FIBs and other vacuum sample chambers.