Rigaku to Present Latest Analytical Instrumentation at Microscopy & Microanalysis Meeting
19 Jul 2017Product news
Rigaku Corporation, a global leader in X-ray analytical technology, will be presenting its lines of X-ray microscopy and computed tomography instrumentation at the Microscopy & Microanalysis 2017 Meeting (M&M 2017), to be held 6-10th August, 2017 at America's Center in St. Louis, Missouri.
X-ray microscopy and computed tomography equipment from Rigaku enable nondestructive analysis of large samples at high resolution. X-ray microscopy (XRM) is suited to a range of materials, from low-density substances such as biological samples, to high-density materials such as ceramics and steels. Computed tomography (CT) reveals, at high-speed the high-resolution, three dimensional structure of an object, by means of computer-processed combinations of numerous X-ray images taken from different angles.
The Microscopy & Microanalysis Meeting is the world’s largest scientific gathering of microscopy and microanalysis professionals, academics, technicians, students and exhibitors. It provides a forum for the presentation and discussion of a wide range of microscopy and microanalysis techniques and their application to the biological and physical sciences. Rigaku will present its current XRM and CT solutions at booth 218.
Find out more about Rigaku and their products here.
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nano3DX XRM
Rigaku CorporationRigaku nano3DX is a true X-ray microscope (XRM) with the ability to measure relatively large samples at high resolution. This is accomplished by using a high powered rotating anode X-ray source and a high-resolution CCD imager. The rotating anode provides for fast data acquisition and the ability to switch anode materials easily to optimize the data acquisition. AVAILABILITY: Japan, Austraila/NZ and North AmericaThe new nano3DX allows you see into many types of samples, including those that have low absorption contrast, for example CFRP, or denser materials like ceramic composites. The nano3DX allows you to achieve this by providing the ability to change the X-ray wavelength to enhance contrast or penetration.In the nano3DX, the magnification takes place in the detector using true microscope elements. This design places the sample close to a high-resolution detector, allowing for a near-parallel beam experiment. This means greater instrument stability and shorter data collection times providing the highest resolution of any X-ray microscope in its class.The nano3DX design is a vast improvement over older implementations that use a small source and a long sample-to-detector distance. This geometric magnification requires a very small source and extreme stability to prevent smearing. Data acquisition times can be quite long because small sources are also low power.nano3DX XRM Features: Ultra-wide field of view, 25X larger volume than comparable systems 3 X-ray wavelengths (Cr, Cu and Mo Ka) to optimize imaging for different sample matrices Parallel beam geometry for high contrast and rapid data collection Auto 5-axis (XYZ and rotation) stage and on-axis imaging system High resolution three dimensional (3D) images High power rotating anode X-ray source High contrast for low-Z materials High-resolution CCD imager